Kumu Hou Maʻamau Kaʻaahi 206 202 Mana Mana no ka F00VC45204 Hui Pū ʻIa

ʻO kahi ʻano lapaʻau ʻili no ka ʻaila ʻaila o kahi mea hoʻoheheʻe wahie hou

E hahai i nā ʻanuʻu ma lalo:

1) Kani ultrasonic hoʻomaʻemaʻe o ka aila koila me metala degreasing agen no 30 minuke, a laila maloʻo;

2) Hoʻomaʻemaʻe mua-sputter
Hoʻokomo ʻia nā kola aila i hoʻomaʻemaʻe ʻia a maloʻo i loko o ke keʻena ʻāwīwī o ke kahua paʻa i hoʻopaʻa ʻole ʻia ka magnetron sputtering ion plating lako, a hana ʻia ka hoʻomaʻemaʻe ion sputtering no 30 a 60 mau minuke;

3) Ka uhi
I loko o ke keʻena maloʻo o ka mea paʻa paʻa ʻole i ka magnetron sputtering ion plating lako, ua sputtered nā ʻaila ʻaila me nā mea metala no 10 a 20 mau minuke e hana i kahi papa hoʻololi o nā mea metala maʻemaʻe, a ua sputtered nā ʻātoma kalapona me nā mea metala no 50. i 80 minuke. Atom sputtering e hana i kahi papa gradient haku mele, metala atom sputtering a me carbon atom sputtering no 90 a 120 minuke e hana ai i ka nano-multilayer amorphous carbon film doped me ka trace metal atoms;

ʻO nā ʻātoma metala i ʻōlelo ʻia ma luna nei he chromium Cr, a i ʻole titanium Ti, a i ʻole zirconium Zr, a i ʻole kālā.

4. The ili lapaʻau ala o ka novel wahie injector nila e like me ka koi 3, i ikeia i loko o ia: i oleloia ka anuu 2), argon pono e hookomo i loko o ka momi keena me ka maemae o 99.99% a me ka holo ana o 25 ~ 35 sccm .

5. ʻO ke ʻano o ka hoʻomaʻamaʻa ʻana i ka ʻili o kahi mea hou wahie injector nila e like me ke koi 4, i hōʻike ʻia i kēlā: i ʻōlelo ʻia i ka ʻanuʻu 3), pono e hoʻokomo ʻia ke kinoea argon i loko o ke keʻena māmā me ka hoʻomaʻemaʻe o 99.99% a me kahi kahe kahe o 15 ~ 30. sccm.